Highly selective sputtering of silicon from TiSi2 at elevated temperature
- J.M.E. Harper
- S. Motakef
- et al.
- 1992
- Applied Physics Letters
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122 results for J.M.E. Harper
Kinetic analysis of C49-TiSi2 and C54-TiSi2 formation at rapid thermal annealing rates
- L. Clevenger
- J.M.E. Harper
- et al.
- 1992
- Journal of Applied Physics
The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
- L. Clevenger
- A. Mutscheller
- et al.
- 1992
- Journal of Applied Physics
Temperature and substrate dependence of Ar sputtering of CoSi2 thin films
- Q.Z. Hong
- J.M.E. Harper
- 1992
- Journal of Applied Physics
Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
- Karen Holloway
- Peter M. Fryer
- et al.
- 1992
- Journal of Applied Physics
Focused ion beam imaging of grain growth in copper thin films
- J. Gupta
- J.M.E. Harper
- et al.
- 1992
- Applied Physics Letters
Nondestructive detection of titanium disilicide phase transformation by picosecond ultrasonics
- H.-N. Lin
- R.J. Stoner
- et al.
- 1992
- Applied Physics Letters
Stability of C49 and C54 phases of TiSi2 under ion bombardment
- S. Motakef
- J.M.E. Harper
- et al.
- 1991
- Journal of Applied Physics
On the formation of copper-rich copper silicides
- L. Stolt
- F.M. D'Heurle
- et al.
- 1991
- Thin Solid Films
Formation of Cu3Si and its catalytic effect on silicon oxidation at room temperature
- L. Stolt
- A. Charai
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films