Effects of underlayer on performance of bilayer resists for 248-nm lithography
- Katherina Babich
- Alessandro Callegari
- et al.
- 1998
- Microlithography 1998
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85 results for Karen Petrillo
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
A method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist-KRS
- Karen Petrillo
- James Brancaccio
- et al.
- 1997
- Microlithography 1997
Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994
Process optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Gel resist processing for submicron CMOS and bipolar circuits
- K.E. Petrillo
- M. Smyth
- et al.
- 1989
- Proceedings of SPIE 1989
A high performance liquid-nitrogen CMOS SRAM technology
- J.Y.-C. Sun
- S. Klepner
- et al.
- 1988
- ESSDERC 1988
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.