Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Michiel Sprik
Journal of Physics Condensed Matter
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
M. Hargrove, S.W. Crowder, et al.
IEDM 1998