The chemisorption of SiCl4, Si2Cl6 and chlorine on Si(111) 7 × 7
- L.J. Whitman
- S.A. Joyce
- et al.
- 1990
- Vacuum
Paper
Publications
30 results for Jory A. Yarmoff
Electron attenuation lengths at SiO2/Si interfaces
- J.A. Yarmoff
- S.A. Joyce
- et al.
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
PaperPhotoelectron spectroscopic study of the interaction of thin Fe films with the MoS2(0001) surface
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Surface Science
PaperChemical effects of Ne+ bombardment on the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Surface Science
PaperThe chemical interaction of Mn with the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperThe interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- Surface Science
PaperMechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- Jory A. Yarmoff
- F. Read McFeely
- 1988
- Journal of Applied Physics
PaperMicroscopic structure of the SiO2/Si interface
- F.J. Himpsel
- F.R. McFeely
- et al.
- 1988
- Physical Review B
PaperEffect of sample doping level during etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1988
- Physical Review B
PaperChemical selectivity in photon-stimulated desorption of fluorine from silicon
- J.A. Yarmoff
- A. Taleb-Ibrahimi
- et al.
- 1988
- Physical Review Letters
Paper