Fluoropolymer platforms for 157 nm resist applications

Summary form only given. This paper reports progress in the development of 157 nm chemically amplified positive resists, describing the polymer syntheses, polymer characterization (e.g. composition, molecular weight, thermal behavior, dissolution kinetics), and lithographic imaging. Our resists are based on α-trifluoromethylacrylic monomers and hexafluoroisopropanol which has a pKa similar to that of phenol.