Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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120 results for William D. Hinsberg
Block copolymer based nanostructures: Materials, processes, and applications to electronics
- Ho-Cheol Kim
- Sang-Min Park
- et al.
- 2009
- Chemical Reviews
Surface patterns from block copolymer self-assembly
- Ho-Cheol Kim
- William D. Hinsberg
- 2008
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Control of Fano line shapes by means of photonic crystal structures in a dye-doped polymer
- Rik Harbers
- Selim Jochim
- et al.
- 2007
- Applied Physics Letters
Lasing in interferometrically structured organic materials
- Rik Harbers
- John A. Hoffnagle
- et al.
- 2005
- Applied Physics Letters
Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography
- William Hinsberg
- Frances Houle
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Oriented mesoporous organosilicate thin films
- Erik M. Freer
- Leslie E. Krupp
- et al.
- 2005
- Nano Letters
Chemical mapping of polymer photoresists by scanning transmission x-ray microscopy
- Ligia Muntean
- Romain Planques
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fourier transform infrared spectroscopy studies of water-polymer interactions in chemically amplified photoresists
- Laurie A. McDonough
- Viktor Chikan
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules