Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Publications
120 results for William D. Hinsberg
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2010
- ACS Nano
A method to characterize pattern density effects: Chemical flare and develop loading
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Self-assembling materials for lithographic patterning: Overview, status and moving forward
- William Hinsberg
- Joy Cheng
- et al.
- 2010
- SPIE Advanced Lithography 2010
Block copolymer based nanostructures: Materials, processes, and applications to electronics
- Ho-Cheol Kim
- Sang-Min Park
- et al.
- 2009
- Chemical Reviews
Directed self-assembly on sparse chemical patterns for lithographic applications
- Joy Y. Cheng
- Alshakim Nelson
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Surface patterns from block copolymer self-assembly
- Ho-Cheol Kim
- William D. Hinsberg
- 2008
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films