William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Paper
Directed self-assembly on sparse chemical patterns for lithographic applications
Abstract
No abstract available.
Related
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
David B. Mitzi
Journal of Materials Chemistry