Examination of flatband and threshold voltage tuning of HfO2/TiN field effect transistors by dielectric cap layers
- S. Guha
- V.K. Paruchuri
- et al.
- 2007
- Applied Physics Letters
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150 results for Matthew Copel
Atomic transport and integrity of Al2O3(2.0 nm)/HfO2(2.5 nm) gate stacks on Si
- L. Miotti
- R.P. Pezzi
- et al.
- 2007
- Applied Physics Letters
Solution-based processing of the phase-change material KSb 5S8
- David B. Mitzi
- Simone Raoux
- et al.
- 2006
- Chemistry of Materials
Hafnium oxide gate dielectrics on sulfur-passivated germanium
- Martin M. Frank
- Steven J. Koester
- et al.
- 2006
- Applied Physics Letters
Self-assembled multilayers of transition-metal-terpyridinyl complexes; formation, and characterization
- Laura Kosbar
- Charan Srinivasan
- et al.
- 2006
- Langmuir
Evidence of electron and hole inversion in GaAs metal-oxide-semiconductor capacitors with HfO 2 gate dielectrics and α-Si/SiO 2 interlayers
- S.J. Koester
- E.W. Kiewra
- et al.
- 2006
- Applied Physics Letters
Oxygen transport and reaction mechanisms in rhenium gate contacts on hafnium oxide films on Si
- R.P. Pezzi
- M. Copel
- et al.
- 2006
- Applied Physics Letters
Effect of oxide overlayer formation on the growth of gold catalyzed epitaxial silicon nanowires
- Hemanth Jagannathan
- Yoshio Nishi
- et al.
- 2006
- Applied Physics Letters
Reduction of hafnium oxide and hafnium silicate by rhenium and platinum
- M. Copel
- R.P. Pezzi
- et al.
- 2006
- Applied Physics Letters
Solution-processed metal chalcogenide films for p-type transistors
- Delia J. Milliron
- David B. Mitzi
- et al.
- 2006
- Chemistry of Materials