Publications

14 results for W.K. Henson

A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
- - Tenko Yamashita
  - S. Mehta
  - et al.
- 2015
- VLSI Technology 2015
Deposited ALD SiO₂ high-k/metal gate interface for high voltage analog and I/O devices on next generation alternative channels and FINFET device structures
- - S. Siddiqui
  - M.M. Chowdhury
  - et al.
- 2013
- ECS Meeting 2013
Experimental analysis and modeling of self heating effect in dielectric isolated planar and fin devices
- - S. Lee
  - Richard A. Wachnik
  - et al.
- 2013
- VLSI Technology 2013
Effect of plasma N₂ and thermal NH₃ nitridation in HfO₂ for ultrathin equivalent oxide thickness
- - Min Dai
  - Yanfeng Wang
  - et al.
- 2013
- Journal of Applied Physics
Advanced modeling and optimization of high performance 32nm HKMG SOI CMOS for RF/analog SoC applications
- - Sungjae Lee
  - J. Johnson
  - et al.
- 2012
- VLSI Technology 2012
Chip-level power-performance optimization through thermally-driven across-chip variation (ACV) reduction
- - X. Yu
  - Oleg Gluschenkov
  - et al.
- 2011
- IEDM 2011
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- - S. Krishnan
  - U. Kwon
  - et al.
- 2011
- IEDM 2011
A 0.039um² high performance eDRAM cell based on 32nm high-K/metal SOI technology
- - Nauman Z. Butt
  - Kevin McStay
  - et al.
- 2010
- IEDM 2010
Stress liner proximity technique to enhance carrier mobility in high-κ metal gate MOSFETs
- - Dechao Guo
  - Kathryn Schonenberg
  - et al.
- 2009
- MRS Fall Meeting 2009
Intrinsic effective mobility extraction with extremely scaled gate dielectrics
- - Zuoguang Liu
  - Dechao Guo
  - et al.
- 2010
- Applied Physics Letters