Evaluation of In-line SIMS Impact on Device Reliability and Performance
- Jander Cruz
- Li Xiang
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
20 results for Daniel Schmidt
Model-Based Raman Simulations for Optimized Metrology in Nanosheet Transistor Devices
- Stefan Schoeche
- Aron Cepler
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperIn-line XPS metrology for area selective deposition processes on patterned structures
- Manasa Medikonda
- Linda Wangoh
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperIn-Line Metrology for Sub-2nm Technology Nodes
- Daniel Schmidt
- 2025
- PMI Symposium 2025
Invited talkScatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- Padraig Timoney
- Stefan Schoeche
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paperMetrology-Design Co-Optimization for BEOL dimensional characterization using scatterometry
- Stefan Schoeche
- Daniel Schmidt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paperDeep Learning Assisted Hybrid Metrology of Nanosheet Transistors for Fast Film Characterization
- Tao Cai
- Yifei Li
- et al.
- 2024
- MRS Fall Meeting 2024
PosterIn-Line Metrology for Sub-2nm Technology Nodes
- Daniel Schmidt
- 2024
- FCMN 2024
Invited talkLarge Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging Schemes
- Katherine Sieg
- Chris Bottoms
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Conference paperFrom Lab to Fab - In-line SIMS for Process Control in Nanosheet Gate-All-Around Device Manufacturing
- Stefan Schoeche
- Katherine Sieg
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Conference paper