Publications

18 results for Daniel Schmidt

In-line XPS metrology for area selective deposition processes on patterned structures
- - Manasa Medikonda
  - Linda Wangoh
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
In-Line Metrology for Sub-2nm Technology Nodes
- - Daniel Schmidt
- 2025
- PMI Symposium 2025
Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- - Padraig Timoney
  - Stefan Schoeche
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Metrology-Design Co-Optimization for BEOL dimensional characterization using scatterometry
- - Stefan Schoeche
  - Daniel Schmidt
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Deep Learning Assisted Hybrid Metrology of Nanosheet Transistors for Fast Film Characterization
- - Tao Cai
  - Yifei Li
  - et al.
- 2024
- MRS Fall Meeting 2024
In-Line Metrology for Sub-2nm Technology Nodes
- - Daniel Schmidt
- 2024
- FCMN 2024
From Lab to Fab - In-line SIMS for Process Control in Nanosheet Gate-All-Around Device Manufacturing
- - Stefan Schoeche
  - Katherine Sieg
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Large Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging Schemes
- - Katherine Sieg
  - Chris Bottoms
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Spectral Interferometry for TSV Metrology in Chiplet Technology
- - Stefan Schoeche
  - Daniel Schmidt
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Novel ellipsometry-based machine learning technique for characterization of low sensitivity critical dimensions within gate-all-around transistors
- - Houssam Chouaib
  - Valeria Dimastrodonato
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024