Reduction of hafnium oxide and hafnium silicate by rhenium and platinum
- M. Copel
- R.P. Pezzi
- et al.
- 2006
- Applied Physics Letters
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42 results for Deborah Neumayer
Electron mobility dependence on annealing temperature of W/HfO 2 gate stacks: The role of the interfacial layer
- A.C. Callegari
- P. Jamison
- et al.
- 2006
- Journal of Applied Physics
Hydrogen plasma effects on ultralow-k porous SiCOH dielectrics
- A. Grill
- V. Sternhagen
- et al.
- 2005
- Journal of Applied Physics
Frequency response of top-gated carbon nanotube field-effect transistors
- Dinkar V. Singh
- Keith A. Jenkins
- et al.
- 2004
- IEEE TNANO
Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization
- Alfred Grill
- Deborah A. Neumayer
- 2003
- Journal of Applied Physics
Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-κ insulator: The role of remote phonon scattering
- Massimo V. Fischetti
- Deborah A. Neumayer
- et al.
- 2001
- Journal of Applied Physics
Materials characterization of Zro2-SiO2 and HfO2-SiO2 binary oxides deposited by chemical solution deposition
- D. Neumayer
- E. Cartier
- 2001
- Journal of Applied Physics
Determination of Ir consumption during thermal oxidation and PbZrxTi1-xO3 processing using Bragg-peak fringe analysis
- K.L. Saenger
- D. Neumayer
- 2001
- Journal of Applied Physics
Ultrathin high-K gate stacks for advanced CMOS devices
- E. Gusev
- D.A. Buchanan
- et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Oxygen stoichiometry in PdOx and PdOxPt electrode layers during processing of ferroelectric and high-epsilon perovskites
- K.L. Saenger
- C. Cabral Jr.
- et al.
- 2000
- Journal of Materials Research