Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Paper
Publications
10 results for R. Di Pietro
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Conference paperPositive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paperReactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Conference paperPolymeric organic-inorganic hybrid nanocomposites: Preparation of polyimide-modified poly(silsesquioxane) using functionalized poly(amic acid alkyl ester) precursors
- J.L. Hedrick
- H.J. Cha
- et al.
- 1997
- Macromolecules
PaperNanoscopically engineered organic-inorganic hybrids as low dielectric constant, high modulus insulating materials for microelectronic applications
- J.L. Hedrick
- R.D. Miller
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
PaperCrosslinked networks based on trimethoxysilyl functionalized poly(amic ethyl ester) chain extendable oligomers
- S.A. Srinivasan
- J.L. Hedrick
- et al.
- 1997
- Polymer
PaperCrosslinked polyimide foams derived from poly(imide-propylene oxide) copolymers
- J.L. Hedrick
- K.R. Carter
- et al.
- 1997
- Macromolecular Chemistry and Physics
PaperToughened, inorganic-organic hybrid materials for microelectronic application
- J.L. Hedrick
- S.A. Srinivasan
- et al.
- 1996
- MRS Fall Meeting 1996
Conference paperPolyimide nanofoams from amorphous phase separated triblock copolymers
- R.D. Miller
- K.R. Carter
- et al.
- 1996
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Paper