Topics in polarization ray tracing for image projectors
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2005
- SPIE Optics + Photonics 2005
Publications
16 results for Gregg M. Gallatin
Resist blur and line edge roughness
- Gregg M. Gallatin
- 2005
- SPIE Advanced Lithography 2005
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Dario L. Goldfarb
- Arpan P. Mahorowala
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
- G.M. Gallatin
- F.A. Houle
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
- Patrick P. Naulleau
- Gregg M. Gallatin
- 2003
- Applied Optics