Publications

12 results for Christopher K. Ober

A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2008
- Chemistry of Materials
Control of self-assembly of lithographically patternable block copolymer films
- - Joan K. Bosworth
  - Marvin Y. Paik
  - et al.
- 2008
- ACS Nano
Control of morphology orientation in lithographically patternable diblock copolymers
- - Joan K. Bosworth
  - Xavier Andre
  - et al.
- 2007
- J. Photopolym. Sci. Tech.
Rod-Coil Block Copolymers: An Iterative Synthetic Approach via Living Free-Radical Procedures
- - Padma Gopalan
  - Xuefa Li
  - et al.
- 2003
- J Polym Sci Part A
Synthesis of ROD-coil diblock copolymers via nitroxide functionalized mesogenic ROD segments
- - Padma Gopalan
  - Xuefa Li
  - et al.
- 2002
- ACS National Meeting 2002
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Diffusion and distribution of photoacid generators in thin polymer films
- - Qinghuang Lin
  - Marie Angelopoulos
  - et al.
- 2000
- Materials Research Society Symposium - Proceedings
Supercritical CO₂ processing for submicron imaging of fluoropolymers
- - Narayan Sundararajan
  - Shu Yang
  - et al.
- 1999
- Chemistry of Materials
Polymer platform dependent characteristics of 193 nm photoresists
- - Juliann Opitz
  - R.D. Allen
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography
- - Narayan Sundararajan
  - Christopher F. Keimel
  - et al.
- 1999
- J. Photopolym. Sci. Tech.