Respective mobilities of metal and silicon in disilicides: Bilayers of chromium with molybdenum or tungsten
- O. Thomas
- T.G. Finstad
- et al.
- 1990
- Journal of Applied Physics
Paper
Publications
7 results for T.G. Finstad
Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- O. Thomas
- A. Charai
- et al.
- 1989
- Thin Solid Films
PaperSome properties of CrxV1-xSi2 and CrxMo1-xSi2 thin films
- O. Thomas
- Steve Molis
- et al.
- 1989
- Applied Surface Science
PaperBilayers with chromium disilicide: Chromium-vanadium
- T.G. Finstad
- O. Thomas
- et al.
- 1989
- Applied Surface Science
PaperResistivity of the solid solutions (Co-Ni)Si2
- F.M. D'Heurle
- J. Tersoff
- et al.
- 1986
- Journal of Applied Physics
PaperThe formation of disilicides from bilayers of Ni/Co and Co/Ni on silicon: Phase separation and solid solution
- T.G. Finstad
- D.D. Anfiteatro
- et al.
- 1986
- Thin Solid Films
PaperReaction of silicon with films of CoNi alloys: Phase separation of the monosilicides and nucleation of the disilicides
- F.M. D'Heurle
- D.D. Anfiteatro
- et al.
- 1985
- Thin Solid Films
Paper