Controlled Modification of Organic Polymer Surfaces by Continuous Wave Far-Ultraviolet (185 nm) and Pulsed-Laser (193 nm) Radiation: XPS Studies
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9 results for Peter D. Hoh
Plasma-etching processes for ULSI semiconductor circuits
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- IBM J. Res. Dev
PaperImprovements in Index Alignment Method for Laser-Fiber Array Packaging
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- IEEE Transactions on Components Packaging and Manufacturing Technology Part B
PaperUnpinned gallium oxide/GaAs interface by hydrogen and nitrogen surface plasma treatment
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- Applied Physics Letters
PaperA GaAs MESFET IC for Optical Multiprocessor Networks
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- IEEE T-ED
PaperGaAs MESFET 16 × 16 crosspoint switch at 1700 Mbits/sec
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Conference paperCharacterization of GaAs self-aligned refractory-gate metal-semiconductor field-effect transistor (MESFET) integrated circuits
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- Journal of Applied Physics
PaperSummary Abstract: Quantitative particulate contamination studies utilizing reduced turbulence pumping and venting
- Peter D. Hoh
- 1984
- JVSTA
PaperA computer calculation of step coverage in SiO thin films
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- Thin Solid Films
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