Conference paper
Optimization of ESCAP photoresist for x-ray lithography
A.T.S. Pomerene, K.E. Petrillo, et al.
Microlithography 1994
Conference paper
Thermolysis of selected polymethacrylates
Abstract
A report is presented on the thermal decomposition behavior of several polymethacrylates and the effect of the ester structure on the thermolysis in correlation with the photosensitivity in acid-catalyzed thermolysis. Differential scanning calorimetry (DSC) curves of the polymethacrylates and presented together with that of PMAA Polymethacrylic Acid PMAA loses absorbed water below 140°C (1st heating), and then dehydrates to form PMAN, at the temperature ranging from 180 to 260°C.
Related
M. Rajaratnam, M. Reilly, et al.
Microelectronic Engineering
N. Fender, P.J. Brock, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Hiroshi Ito, L.A. Pederson, et al.
JES