Fluoropolymer platforms for 157 nm resist applications
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
A report is presented on the thermal decomposition behavior of several polymethacrylates and the effect of the ester structure on the thermolysis in correlation with the photosensitivity in acid-catalyzed thermolysis. Differential scanning calorimetry (DSC) curves of the polymethacrylates and presented together with that of PMAA Polymethacrylic Acid PMAA loses absorbed water below 140°C (1st heating), and then dehydrates to form PMAN, at the temperature ranging from 180 to 260°C.
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
T. Kajita, Y. Nishimura, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Hiroshi Ito, H.D. Truong, et al.
J. Photopolym. Sci. Tech.
T. Lindsay, G.G. Barclay, et al.
Microelectronic Engineering