Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We present a new rational algorithm for solving Risch differential equations in towers oftranscendental elementary extensions. In contrast to a recent algorithm of Davenport we do not require a progressive reduction of the denominators involved, but use weak normality to obtain a formula for the denominator of a possible solution. Implementation timings show this approach to be faster than a Hermite-like reduction. © 1990, Academic Press Limited. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Yixiong Chen, Weichuan Fang
Engineering Analysis with Boundary Elements