Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
We determine the maximum spectral radius for (0,1)-matrices with k2 andk2+1 1's, respectively, and for symmetric (0,1)-matrices with zero trace and e= k 21's (graphs with e edges). In all cases, equality is characterized. © 1985.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Quantum Machine Intelligence
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