Conference paperSeparation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFETMiaomiao Wang, Zuoguang Liu, et al.IRPS 2015
Conference paperProcess optimizations for NBTI/PBTI for future replacement metal gate technologiesBarry P. Linder, A. Dasgupta, et al.IRPS 2016
Conference paperA 7nm FinFET technology featuring EUV patterning and dual strained high mobility channelsRuilong Xie, Pietro Montanini, et al.IEDM 2016
Conference paperContact Cavity Shaping and Selective SiGe:B Low-Temperature Epitaxy Process Solution for sub 10-9 Ω.cm2 Contact Resistivity in Nonplanar FETsN. Breil, B.-C. Lee, et al.VLSI Technology 2023
