Chen Zhang, Zuoguang Liu, et al.
IEEE T-ED
Paper
Sub-10-9 Ω-cm2 n-Type Contact Resistivity for FinFET Technology
Abstract
We report record low 8.4 × 10-10Ω-cm2 n-type S/D contact resistivity with laser-induced solid/liquid phase epitaxy of Si
Related
Timothy A. Brunner, Vinayan C. Menon, et al.
Journal of Micro/Nanolithography, MEMS, and MOEMS
Zuoguang Liu, Oleg Gluschenkov, et al.
VLSI Technology 2017
Zuoguang Liu, Dechao Guo, et al.
Applied Physics Letters