D. Henderson, M. Plischke
Proceedings of The Royal Society of London, Series A: Mathematical and Physical Sciences
Paper
Simulation of structural anisotropy and void formation in amorphous thin films
Abstract
We have computer simulated the structure of thin amorphous films grown from a vapor. Our hard-sphere model shows that structural anisotropy and voids are a natural occurrence of the deposition process. The amount of unfilled space (voids) and the anisotropy have been studied as a function of the angle of incidence of the vapor stream upon the substrate. © 1974 American Institute of Physics.
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