J.K. Gimzewski, T.A. Jung, et al.
Surface Science
Paper
Reduced hot-carrier reliability degradation of x-ray irradiated MOSFETs in a 0.25 μm CMOS technology with ultra-thin gate oxide
Abstract
No abstract available.
Related
Paper
The DX centre
T.N. Morgan
Semiconductor Science and Technology
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020