PaperPolymer degradation in reactive ion etching and its possible application to all dry processesH. Hiraoka, L.W. Welsh Jr.Radiation Physics and Chemistry
Conference paperSub-halfmicron negative resist systems by image reversalK. Chiong, H. HiraokaProceedings of SPIE 1989
Conference paperEnhancement of RIE resistance of conventional resist materialsH. HiraokaProceedings of SPIE 1989
PaperAll Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related PolymersH. HiraokaJES