Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
New phase-change materials from single composite target are systematically studied. It integrated with high Indium doped AsSeGe selector, demonstrates a wide memory window, stable 1E7 chips level write cycles (using 400ns box SET) and non-detectable and drift characteristic at 85ºC/1 day in 256kbits ADM memory arrays.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John G. Long, Peter C. Searson, et al.
JES
E. Burstein
Ferroelectrics
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics