William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
The integration of a new aqueous clean, dSP+, has been demonstrated for aluminum interconnect technology in advanced DRAM products. The dSP+ chemistry was targeted for two back-end-of-line (BEOL) applications: post Al RIE clean and via clean. The results in this paper are discussed using SEM, reliability, and electrical parametric data.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Imran Nasim, Melanie Weber
SCML 2024
Lawrence Suchow, Norman R. Stemple
JES