American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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Mechanistic studies of chemically amplified photoresists

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A reinvestigation of the etch products of silicon and XeF₂: Doping and pressure effects

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In situ Fourier transform infrared spectroscopy and stochastic modeling of surface chemistry of amorphous silicon growth

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Journal of Applied Physics

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Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist

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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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