American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Apr 1997

Mechanistic studies of chemically amplified photoresists

Conference paper

Chemistry controlling nanoscale pattern formation by deep UV photolithography

F.A. Houle, W.D. Hinsberg, et al.

ACS Spring 1999

Conference paper

Optimized acid release underlayers for 157 nm lithography

Carl E. Larson, G.M. Wallraff, et al.

Microlithography 2004

Conference paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist

F.A. Houle, G.M. Poliskie, et al.

Microlithography 2000

Paper

Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance

W.D. Hinsberg, F.A. Houle, et al.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

View all publications