Low-temperature formation of CoSi ₂ in the presence of Au

The formation of cobalt silicides in the presence of interlayers and capping layers of Au, using both ex situ and in situ characterization techniques was studied. It was found that the formation temperature of CoSi 2 was significantly lowered in the presence of Au. It was shown that for thin interlayers or capping layers, Au does not significantly affect the formation of Co 2Si and CoSi, while it lowers the nucleation temperature of CoSi 2. CoSi 2 appears to form as the first place at temperatures as low as 300°C for thick interlayers.