Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We review our work towards achieving competitive performance (classification accuracies) for on-chip machine learning (ML) of large-scale artificial neural networks (ANN) using Non-Volatile Memory (NVM)-based synapses, despite the inherent random and deterministic imperfections of such devices. We then show that such systems could potentially offer faster (up to 25×) and lower-power (from 120-2850×) ML training than GPU-based hardware.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Sanjay Kariyappa, Hsinyu Tsai, et al.
IEEE T-ED
Geoffrey W. Burr, Edmond Chow, et al.
NPIS 2005
S. Sidler, Irem Boybat, et al.
ESSDERC 2016