Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This historical review covers IBM experiments in evaluating radiation-induced soft fails in LSI electronics over a fifteen-year period, concentrating on major scientific and technical advances which have not been previously published.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Anupam Gupta, Viswanath Nagarajan, et al.
Operations Research
Alfonso P. Cardenas, Larry F. Bowman, et al.
ACM Annual Conference 1975
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev