Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper presents the design, fabrication, and characterization of high-performance 0.lμm-channel CMOS devices with dual n+/p+ polysilicon gates on 3SA-thick gate oxide. A 22ps/stage CMOS-inverter delay is obtained at a power supply voltage of 1.5V. The highest unity-current-gain frequencies (fT) measured are 118 GHz for nMOSFET, and 67 GHz for pMOSFET.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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JES
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IEDM 1993
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IEDM 1993