Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper reports a new mounting technique for bonding silicon-Pyrex-silicon stacks based on anodic bonding and alternating current (a.c.) excitation. The bond is mechanically stable and strong enough to withstand a shear force of at least 1 MPa, or further reactive ion and wet chemical etching processes. The technique has been optimized to be independent of various modifications of the stack dimensions or bonding parameters (e.g., temperature, voltage, quality of the contact).
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ellen J. Yoffa, David Adler
Physical Review B
R. Ghez, J.S. Lew
Journal of Crystal Growth
J.K. Gimzewski, T.A. Jung, et al.
Surface Science