J.W. Huang, D.F. Gaines, et al.
Journal of Electronic Materials
The reliability of molten KOH for revealing dislocations intersecting {100} faces of GaAs has been tested using transmission x-ray topography. It is found to be a "faithful" etch.
J.W. Huang, D.F. Gaines, et al.
Journal of Electronic Materials
G.R. Woolhouse, A.E. Blakeslee, et al.
Journal of Applied Physics
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
R.M. Potemski, M.B. Small
Journal of Crystal Growth