Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
In this paper, we report the improvement of a process for full microfabrication of miniaturized electron lenses specially design for low-energy (100 eV) lithography tools. The main advantages of this technique are the following. It is batch processing oriented, meaning that lenses can be easily built in a full wafer fabrication. With this procedure it is possible to develop a completely integrated process for machining arrays of lenses. Lens bores are aligned using an electron lithography process, resulting in highly accurate positioning. Finally, the source lens chip has not only one but several sets of lenses with different aperture sizes, each producing a different beam diameter. A scheme is proposed with which the appropriate lens can be selected by means of a deflection system.
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano