M.I. Nathan, M. Heiblum, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Analyzing possible relaxation mechanisms in two-dimensional electron gas in GaAs-AlGaAs inverted structures we show that the existence of unintentional acceptor doping in the AlGaAs barriers, with concentration as high as 10 17 cm-3, provides the only explanation for the observed transport and single particle relaxation times.
M.I. Nathan, M. Heiblum, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
B. Laikhtman
Physical Review B
M. Heiblum
IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits 1984
E. Mendez, M. Heiblum, et al.
Physical Review B