Yu Gyeong Kang, Masatoshi Ishii, et al.
Advanced Science
We present for the first time in-depth analysis of the outstanding endurance characteristics of an ALD-based confined phase change memory (PCM) [1] with a thin metallic liner. Experimental results confirm that both the proper metallic liner and the confined pore cell structure are required for a reliability advantage. This confined PCM with a metallic liner is found to be immune to classic endurance failure mechanisms. The void-free confined PCM yields a new record endurance (2×1012 cycles) with stabilized elemental segregation that does not result in stuck-SET failure.
Yu Gyeong Kang, Masatoshi Ishii, et al.
Advanced Science
Win-San Khwa, Meng-Fan Chang, et al.
ISSCC 2016
Robert L. Bruce, Gloria Fraczak, et al.
SPIE Advanced Lithography 2017
F. Menges, Fabian Motzfeld, et al.
IEDM 2016