Tak H. Ning, Peter W. Cook, et al.
IEEE JSSC
This paper attempts to provide a technical perspective for a 1 $um MOSFET VLSI technology described in the technical papers that follow. Highlights of various aspects of the technology development are discussed briefly. These include device design, circuit design, hot-electron effects, processing technology, electron-beam lithography metal suicide interconnections and radiation effects. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
Tak H. Ning, Peter W. Cook, et al.
IEEE JSSC
Tak H. Ning, Peter W. Cook, et al.
IEEE JSSC
William R. Hunter, Linda Ephrath, et al.
IEEE T-ED
Arnold Reisman
Proceedings of the IEEE