Physical characterization of sub-32-nm semiconductor materials and processes using advanced ion beam-based analytical techniques
- M. Hopstaken
- D. Pfeiffer
- et al.
- 2012
- Surface and Interface Analysis
Paper
Publications
19 results at Surface and Interface Analysis
SIMS quantification of SiGe composition with low-energy ion beams
- Zhengmao Zhu
- Paul Ronsheim
- et al.
- 2011
- Surface and Interface Analysis
PaperThe early history and future of the SEM
- Oliver C. Wells
- David C. Joy
- 2006
- Surface and Interface Analysis
Conference paperAdhesion of copper and chromium films to polyimide studied by static SIMS of the interface
- W.J. van Ooij
- R.H.G. Brinkhuis
- et al.
- 2004
- Surface and Interface Analysis
PaperInvestigation of gallium arsenide multilayer structures using a tunnelling microscope combined with a UHV‐SEM
- O. Albrektsen
- H. Salemink
- 2004
- Surface and Interface Analysis
PaperQuantitative time‐of‐flight secondary ion mass spectrometry of a perfluorinated polyether
- David E. Fowler
- Roboert D. Johnson
- et al.
- 2004
- Surface and Interface Analysis
PaperA comparative study of SIMS depth profiling of boron in silicon
- J.B. Clegg
- A.E. Morgan
- et al.
- 2004
- Surface and Interface Analysis
PaperMechanism of silicon surface roughening by reactive ion etching
- Gottlieb S. Oehrlein
- Robert G. Schad
- et al.
- 2004
- Surface and Interface Analysis
PaperStudy of near‐surface disorder and surface residues after reactive Ion etching of Silicon
- G.S. Oehrlein
- G.J. Coyle
- et al.
- 2004
- Surface and Interface Analysis
PaperChromium chromate as an inert marker in copper oxidation
- Robert J. Day
- Margaret A. Frisch
- 2004
- Surface and Interface Analysis
Paper