Publications

20 results at SPIE Advanced Lithography 2011

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- - Gregory McIntyre
  - Daniel Corliss
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- - Ryoung-Han Kim
  - Chiew-Seng Koay
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Contact patterning strategies for 32nm and 28nm technology
- - Bradley Morgenfeld
  - Ian Stobert
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Applicability of global source mask optimization to 22/20nm node and beyond
- - Kehan Tian
  - Moutaz Fakhry
  - et al.
- 2011
- SPIE Advanced Lithography 2011
EUV OPC for 56 nm metal pitch
- - Martin Burkhardt
  - Matt Colburn
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Reconciling measurements in AFM reference metrology when using different probing techniques
- - Narender Rana
  - Charles Archie
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- - Qinghuang Lin
  - Alshakim Nelson
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011