Publications

15 results at SPIE Advanced Lithography 2012

Patterning of CMOS device structures for 40-80nm pitches and beyond
- - Sebastian U. Engelmann
  - R.M. Martin
  - et al.
- 2012
- SPIE Advanced Lithography 2012
The effects of plasma exposure on low-k dielectric materials
- - J.L. Shohet
  - H. Ren
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Advanced plasma etch technologies for nanopatterning
- - Rich Wise
- 2012
- SPIE Advanced Lithography 2012
Pattern collapse mitigation strategies for EUV Lithography
- - Dario L. Goldfarb
  - Robert L. Bruce
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Process optimization through model based SRAF printing prediction
- - Ramya Viswanathan
  - Jaione Tirapu Azpiroz
  - et al.
- 2012
- SPIE Advanced Lithography 2012
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Computing exact Fourier series coefficients of IC rectilinear polygons from low-resolution fast Fourier coefficients
- - Robin Scheibler
  - Paul Hurley
- 2012
- SPIE Advanced Lithography 2012
Fast source independent estimation of lithographic difficulty supporting large scale source optimization
- - David Demaris
  - Maria Gabrani
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Lens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
- - Scott Halle
  - Michael Crouse
  - et al.
- 2012
- SPIE Advanced Lithography 2012
High order wafer alignment in manufacturing
- - Michael Pike
  - Nelson Felix
  - et al.
- 2012
- SPIE Advanced Lithography 2012