Publications

12 results at SPIE Advanced Lithography 2020

Simulation of photoresist defect transfer through subsequent patterning processes
- - Dominik Metzler
  - Mohamed Oulmane
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Hydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas
- - L. Buzi
  - J. M. Papalia
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning
- - Scott D. Halle
  - Max O. Bloomfield
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- - Chris Robinson
  - Cody Murray
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUVL mask process development and verification using advanced modeling and characterization techniques
- - Michael Green
  - Romain Lallement
  - et al.
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- - Mary Breton
  - Jennifer Fullam
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- - Dario Goldfarb
  - Olivia Wang
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2020
- SPIE Advanced Lithography 2020