Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- K. Chiong
- F.J. Hohn
- 1990
- Microlithography 1990
Conference paper
Publications
11 results at Microlithography 1990
Stepper self-metrology using automated techniques
- T.A. Brunner
- J.M. Lewis
- et al.
- 1990
- Microlithography 1990
Conference paperQuantitative measures for surface texture description in semiconductor wafer inspection
- A.Ravishankar Rao
- Ramesh Jain
- 1990
- Microlithography 1990
Conference paperModel for focused ion beam deposition
- J.P. Levin
- P.G. Blauner
- et al.
- 1990
- Microlithography 1990
Conference paperALF: A facility for x-ray lithography
- L. Grant Lesoine
- Kenneth W. Kukkonen
- et al.
- 1990
- Microlithography 1990
Conference paperElectron beam lithography, directions in direct write and mask making
- F.J. Hohn
- 1990
- Microlithography 1990
Conference paper1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Conference paperA highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Conference paperModified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Conference paperNegative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
Conference paper