Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Conference paper
Publications
16 results at ACS Spring 1991
Strategies for crosslinking NLO-polymers across the chromophore
- K. Betterton
- M. Ebert
- et al.
- 1991
- ACS Spring 1991
Conference paperMethacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Conference paperBase-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Conference paperChemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Conference paperBase-catalyzed cyclization of ortho-aromatic amide-alkyl esters: a novel approach to chemical imidization
- W. Volksen
- T. Pascal
- et al.
- 1991
- ACS Spring 1991
Conference paperOverview of top-surface-imaging resists
- Scott A. MacDonald
- 1991
- ACS Spring 1991
Conference paperSynthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures
- G.M. Wallraff
- J.L. Hedrick
- et al.
- 1991
- ACS Spring 1991
Conference paperInfluence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Conference paperAcid-catalyzed dehydration for the design of chemical amplification resists
- Hiroshi Ito
- R. Sooriyakumaran
- et al.
- 1991
- ACS Spring 1991
Conference paper