Publications

22 results at Microlithography 1993

Characterization and simulation of acid catalyzed DUV positive photoresist
- - Nicholas K. Eib
  - Eytan Barouch
  - et al.
- 1993
- Microlithography 1993
Resist materials design: Base-catalyzed chemical amplification
- - C.G. Wilison
  - J.F. Cameron
  - et al.
- 1993
- Microlithography 1993
Comparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- - Mark A. Hartney
  - Roderick R. Kunz
  - et al.
- 1993
- Microlithography 1993
New chemistry in the i)esign of chemically amplified positive resists
- - Robert D. Allen
  - Quan P. Ly
  - et al.
- 1993
- Microlithography 1993
The influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- - V. Rao
  - W.D. Hinsberg
  - et al.
- 1993
- Microlithography 1993
Base-catalyzed photosensitive polyimide
- - Dennis R. McKean
  - Gregory M. Waliraff
  - et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- - W.D. Hinsberg
  - Scott A. MacDonald
  - et al.
- 1993
- Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithography
- - Roderick R. Kunz
  - Robert D. Allen
  - et al.
- 1993
- Microlithography 1993
Positive tone dry-develop resist based on cross-linking a phenolic resin
- - Scott A. MacDonald
  - C.B. Larson
  - et al.
- 1993
- Microlithography 1993
Molecular design for stabilization of chemical amplification resist toward airborne contamination
- - Hiroshi Ito
  - William P. England
  - et al.
- 1993
- Microlithography 1993