Publications

15 results at Microlithography 2003

Does line edge roughness matter?: FEOL and BEOL perspectives
- - Qinghuang Lin
  - Chuck Black
  - et al.
- 2003
- Microlithography 2003
Polymer dynamics and diffusive properties in ultra-thin photoresist films
- - Christopher L. Soles
  - Ronald L. Jones
  - et al.
- 2003
- Microlithography 2003
Rational design in cyclic olefin resists for sub-100nm lithography
- - Wenjie Li
  - P. Rao Varanasi
  - et al.
- 2003
- Microlithography 2003
Deprotection volume characteristics and line edge morphology in chemically amplified resists
- - Ronald L. Jones
  - Tengjiao Hu
  - et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- - William Hinsberg
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
Diffusion induced line edge roughness
- - Michael D. Stewart
  - Gerard M. Schmid
  - et al.
- 2003
- Microlithography 2003
The estimated impact of shot noise in extreme ultraviolet lithography
- - Jonathan Cobb
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- - Hiroshi Ito
  - William D. Hinsberg
  - et al.
- 2003
- Microlithography 2003
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- - Joseph L. Lenhart
  - Daniel A. Fischer
  - et al.
- 2003
- Microlithography 2003