Publications

11 results at SPIE Advanced Lithography 2018

Patterning method impact on sub-36nm pitch interconnect variability
- - N.V. Licausi
  - James C.-H. Chen
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Exploration of resist effect in source mask optimization
- - Ao Chen
  - Yee Mei Foong
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Line edge roughness reduction for 7nm metals
- - Zheng Chen
  - Steve McDermott
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Characterization and control of EUV scanner dose uniformity and stability
- - Chris Robinson
  - Daniel Corliss
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Aqueous developers for positive tone ultrathin chemically amplified EUV resists
- - Dario Goldfarb
  - Bharat Kumar
- 2018
- SPIE Advanced Lithography 2018
Introduction of pre-etch deposition techniques in EUV patterning
- - Xun Xiang
  - Genevieve Beique
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Inorganic hardmask development for EUV patterning
- - Anuja De Silva
  - A. Dutta
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning
- - Angelique Raley
  - Joe Lee
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Polymer brush as adhesion promoter for EUV patterning
- - Jing Guo
  - Anuja De Silva
  - et al.
- 2018
- SPIE Advanced Lithography 2018
The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD
- - Chi-Chun Liu
  - Yann Mignot
  - et al.
- 2018
- SPIE Advanced Lithography 2018