Publications

19 results at SPIE Advanced Lithography 2007

Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- - Alan E. Rosenbluth
  - David Melville
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Modeling polarization for Hyper-NA lithography tools and masks
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Distinguishing dose, focus and blur for lithography characterization and control
- - Christopher P. Ausschnitt
  - Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
Use of starburst patterns in optical lithography
- - M. Burkhardt
  - Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
OPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- - Daniel Fischer
  - Mohamed Talbi
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- - Ian Stobert
  - James Bruce
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- - M. Burkhardt
  - Sean Burns
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- - O.R. Wood II
  - D. Back
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- - Daniel P. Sanders
  - Linda K. Sundberg
  - et al.
- 2007
- SPIE Advanced Lithography 2007