Integrating DfM components into a cohesive design-to-silicon solution
- Lars Liebmann
- Dan Maynard
- et al.
- 2005
- Microlithography 2005
Conference paper
Publications
11 results at Microlithography 2005
Toward through-process layout quality metrics
- Fook-Luen Heng
- Jin-Fuw Lee
- et al.
- 2005
- Microlithography 2005
Conference paperStudies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Conference paper193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
Conference paperLooking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- S.E. Steen
- S.J. McNab
- et al.
- 2005
- Microlithography 2005
Conference paperPerfluoropolyethers as novel materials for soft lithography
- Jason P. Rolland
- Eric C. Hagberg
- et al.
- 2005
- Microlithography 2005
Conference paperSilsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Conference paperLine edge roughness reduction by plasma curing photoresists
- Arpan P. Mahorowala
- Kuang-Jung Chen
- et al.
- 2005
- Microlithography 2005
Conference paperMolecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Conference paperProgress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005
Conference paper