DFM requirements and solution roadmaps: The multi-layer approach
- Juan Antonio Carballo
- Sani Nassif
- 2006
- SPIE Advanced Lithography 2006
Publications
Date
Featured collections
Popular topics
16 results at SPIE Advanced Lithography 2006
Characterization of imaging performance for immersion lithography at NA=0.93
- 2006
- SPIE Advanced Lithography 2006
Silicon IP reuse standards for design for manufacturability
- Juan Antonio Carballo
- Savithri Sundareswaran
- 2006
- SPIE Advanced Lithography 2006
Lithography process optimization using linear superposition of commonly available illumination modes
- Michael M. Crouse
- Yasri Yudhistira
- et al.
- 2006
- SPIE Advanced Lithography 2006
Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006