Publications

16 results at SPIE Advanced Lithography 2006

Lithography process optimization using linear superposition of commonly available illumination modes
- - Michael M. Crouse
  - Yasri Yudhistira
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Silicon IP reuse standards for design for manufacturability
- - Juan Antonio Carballo
  - Savithri Sundareswaran
- 2006
- SPIE Advanced Lithography 2006
Characterization of imaging performance for immersion lithography at NA=0.93
- - Dario Gil
  - Jaione Tirapu-Azpiroz
  - et al.
- 2006
- SPIE Advanced Lithography 2006
DFM requirements and solution roadmaps: The multi-layer approach
- - Juan Antonio Carballo
  - Sani Nassif
- 2006
- SPIE Advanced Lithography 2006
Global optimization of the illumination distribution to maximize integrated process window
- - Alan E. Rosenbluth
  - Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
Adhesion between template materials and UV-cured nanoimprint resists
- - Frances A. Houle
  - Eric Guyer
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Vinyl ether resist system for UV-cured nanoimprint lithography
- - Hiroshi Ito
  - Frances A. Houle
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Direct determination of photoresist composition changes during UV exposure
- - Frances A. Houle
  - Vaughn R. Deline
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Self assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- - C.T. Black
  - R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- - Michael Tittnich
  - John Hartley
  - et al.
- 2006
- SPIE Advanced Lithography 2006