A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Publications
3593 results for Mathematical Sciences
Fabrication of dual damascene BEOL structures using a Multi-Level Multiple Exposure (MLME) scheme - Part 1. Lithographic patterning
- Dario L. Goldfarb
- Stefan Harrer
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
High contact angle fluorosulfonamide-based materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Direct write 3-dimensional nanopatterning using probes
- David Pires
- Armin Knoll
- et al.
- 2010
- SPIE Advanced Lithography 2010
Self-assembling materials for lithographic patterning: Overview, status and moving forward
- William Hinsberg
- Joy Cheng
- et al.
- 2010
- SPIE Advanced Lithography 2010
Polymer waveguide based multi-layer optical connector
- D. Jubin
- Roger F. Dangel
- et al.
- 2010
- SPIE OPTO 2010
Design and implementation of an electro-optical backplane with pluggable in-plane connectors
- Richard C.A. Pitwon
- Ken Hopkins
- et al.
- 2010
- SPIE OPTO 2010
Compact electro-optical module with polymer waveguides on a flexible substrate for high-density board-level communication
- Jonas Weiss
- Tobias Lamprecht
- et al.
- 2010
- SPIE OPTO 2010
Lasing from defect states in mixed-order organic laser structures
- K. Baumann
- Gabriele Raino
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A relaxation-based algorithm for solving the conditional p-center problem
- Doron Chen
- Reuven Chen
- 2010
- Operations Research Letters